An eminent Indian-American scientist has been elected fellow of the prestigious World Technology Network for his innovative work in the field of material science.
Amit Goyal of the Oak Ridge National Laboratory's Materials Science and Technology Division has also been named a finalist for the World Technology Network's materials award, said a media release issued by the US Department of Energy's Oak Ridge National Laboratory.
Goyal received his doctorate in materials science and engineering from the University of Rochester, New York, in 1991 and joined ORNL that same year. With more than 300 publications and 53 patents, Goyal has also been recognised as a Battelle Distinguished Inventor.
Along with Goyal's distinguished recognition in the World Technology Network, he and fellow team members recently won an R&D 100 Award for superconducting wires, his third R&D 100 Award.
He is also a fellow of six other professional societies: the American Association for Advancement of Science, the American Physical Society, the World Innovation Foundation, the American Society of Metals, the Institute of Physics and the American Ceramic Society.
Image: Amit Goyal
